发明名称 |
HEATING APPARATUS AND HEATING METHOD |
摘要 |
A disclosed heating apparatus includes a heating chamber configured to heat a substrate placed in the heating chamber with a heat plate opposing the substrate; a gas stream forming portion that creates a gas stream along a top surface of the substrate in the heating chamber; and a pair of first plate members respectively located between an inner side wall of the heating chamber and a first substrate edge opposing the inner side wall, and between another inner side wall of the heating chamber and a second substrate edge opposing the other inner side wall.
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申请公布号 |
US2008185370(A1) |
申请公布日期 |
2008.08.07 |
申请号 |
US20080022489 |
申请日期 |
2008.01.30 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
FUKUOKA TETSUO;KITANO TAKAHIRO;TERADA KAZUO |
分类号 |
G03F7/40;F27D99/00;H01L21/027 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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