发明名称 |
Memory cell e.g. non-volatile two-bit-Trapping layer-memory cell, operating method for e.g. memory card, involves applying voltage between gate electrode and substrate section such that charge carrier is injected into memory element |
摘要 |
<p>The method involves applying a voltage to p-n junctions (114, 124) among a source region (112), a drain region (122) and a substrate section (130) such that an avalanche breakdown takes place at the respective p-n junction. Another voltage is applied between a gate electrode (170) and the substrate section such that a charge carrier (132) produced by the avalanche breakdown and injected into the substrate section is injected into a memory element that is arranged between the substrate section and the gate electrode. Independent claims are also included for the following: (1) a method for programming a memory cell (2) a method for deleting a memory cell (3) a semiconductor component with memory cells (4) an electronic system comprising the semiconductor component.</p> |
申请公布号 |
DE102007003534(A1) |
申请公布日期 |
2008.08.07 |
申请号 |
DE20071003534 |
申请日期 |
2007.01.24 |
申请人 |
QIMONDA FLASH GMBH & CO. KG;QIMONDA AG |
发明人 |
EMDEN, WALTER VON;TEMPEL, GEORG;RICHTER, DETLEV;KUX, ANDREAS |
分类号 |
G11C16/04;H01L27/115 |
主分类号 |
G11C16/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|