<p>Disclosed is a photosensitive element (1) comprising a supporting film (10) and a layer (photosensitive layer ) (20) which is formed on the supporting film (10) and composed of a photosensitive resin composition. The supporting film (10) has a haze of 0.01-2.0%, and the total number of particles and agglomerates having a diameter of 5 µm or more contained in the supporting film (10) is not more than 5 pieces/mm<SUP>2</SUP>. The photosensitive layer (20) contains a binder polymer (A), a photopolymerizable compound (B) having an ethylenically unsaturated bond, and a photopolymerization initiator (C), and has a thickness of 3-30 µm.</p>
申请公布号
WO2008093643(A1)
申请公布日期
2008.08.07
申请号
WO2008JP51219
申请日期
2008.01.28
申请人
HITACHI CHEMICAL COMPANY, LTD.;KUBOTA, MASAO;TAKANO, SHINJI;YAMADA, EIICHIROU