发明名称 PHOTOSENSITIVE ELEMENT
摘要 <p>Disclosed is a photosensitive element (1) comprising a supporting film (10) and a layer (photosensitive layer ) (20) which is formed on the supporting film (10) and composed of a photosensitive resin composition. The supporting film (10) has a haze of 0.01-2.0%, and the total number of particles and agglomerates having a diameter of 5 µm or more contained in the supporting film (10) is not more than 5 pieces/mm&lt;SUP&gt;2&lt;/SUP&gt;. The photosensitive layer (20) contains a binder polymer (A), a photopolymerizable compound (B) having an ethylenically unsaturated bond, and a photopolymerization initiator (C), and has a thickness of 3-30 µm.</p>
申请公布号 WO2008093643(A1) 申请公布日期 2008.08.07
申请号 WO2008JP51219 申请日期 2008.01.28
申请人 HITACHI CHEMICAL COMPANY, LTD.;KUBOTA, MASAO;TAKANO, SHINJI;YAMADA, EIICHIROU 发明人 KUBOTA, MASAO;TAKANO, SHINJI;YAMADA, EIICHIROU
分类号 G03F7/09;G03F7/004;H05K3/00 主分类号 G03F7/09
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