| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide marks for monitoring a focus, capable of determining the defocus direction, in addition to monitoring a defocus amount and an exposure amount change amount, and to provide a focus monitoring method and a device manufacturing method. <P>SOLUTION: The marks include a dot pattern mark 1 having two dot groups 15, which are constituted of a plurality of dots 4 composed of resists formed by projection with respect to a wafer surface, and a measuring region 3a, and where each dot of the dot groups 15 is arrayed so as to be enlarged in dimension as separated from the measuring region 3a; and a hole pattern mark 2, having two hole groups 16 composed of a plurarity of holes 5 formed on resists the wafer surface and a measurement region 3b, and where the dimension of the respective holes 5 is enlarged, as being separated from the measuring region 3b. <P>COPYRIGHT: (C)2008,JPO&INPIT |
