| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithographic apparatus including a measuring means that measures displacements of a direction which intersects with a scanning direction in a mask stage or wafer stage of a scanning aligner. <P>SOLUTION: A beam irradiated from a beam source 17 fixed to a frame 15 is divided into two beams by a reflective grid 26 fixed to a stage. Further, after each beam penetrates penetration type-second grids 18, 19, third grids 24, 25, and 1/4 wavelength plates 22, 23, the beams are converged at the grid 26 to allow the converged beam to be incident on a sensor. The sensor senses variation in strength with interference of the beam to measure varied amounts of the stage. <P>COPYRIGHT: (C)2008,JPO&INPIT |
