| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of fabricating a grayscale reticle for inexpensively producing a microlens having a near 100% fill factor. <P>SOLUTION: The method includes steps of: preparing a quartz wafer substrate; depositing a layer of SRO (silicon rich oxide) on the top surface of the quartz substrate; patterning and etching the SRO layer to form an initial microlens pattern using step-over lithography; patterning and etching the SRO layer to form a recessed pattern in the SRO layer; depositing an opaque thin film on the SRO layer; patterning and etching the opaque thin film; depositing and planarizing a planarizing layer; and cutting the quartz wafer into rectangular pieces sized to be smaller than a selected blank reticle. A microlens array of a photoimager is formed by using the grayscale reticle manufactured in the above steps. <P>COPYRIGHT: (C)2008,JPO&INPIT |
