ABERRATION EVALUATION PATTERN, ABERRATION EVALUATION METHOD, ABERRATION CORRECTION METHOD, ELECTRON BEAM DRAWING APPARATUS, ELECTRON MICROSCOPE, MASTER, STAMPER, RECORDING MEDIUM AND STRUCTURE

摘要

PROBLEM TO BE SOLVED: To evaluate astigmatism in an irradiation system emitting an electron beam.

SOLUTION: A figure pattern consisting of a plurality of (e.g. four) concentric circles is formed on a reference sample WP and an image (scanned image) is formed based on an electron signal obtained by scanning the reference sample WP with an electron beam. In the scanned image, the image has a blur in a region with its longitudinal direction parallel to the generating direction of the astigmatism and the size of the blur depends on magnitude of the astigmatism. Therefore, the direction and the magnitude of the astigmatism of the irradiation system of an irradiation apparatus 10 can be detected based on the obtained scanned image.

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