发明名称 Photoactive Compounds
摘要 The present application relates to a composition comprising a) a polymer containing an acid labile group; b) a compound selected from (i), (ii) and mixtures thereof, where (i) is Ai Xi Bi and (ii) is Ai Xi1; and c) a compound of formula Ai Xi2 where Ai, Bi, Xi, Xi1, and Xi2 are defined herein. The compositions are useful in the semiconductor industry.
申请公布号 US2008187868(A1) 申请公布日期 2008.08.07
申请号 US20070672077 申请日期 2007.02.07
申请人 PADMANABAN MUNIRATHNA;CHAKRAPANI SRINIVASAN 发明人 PADMANABAN MUNIRATHNA;CHAKRAPANI SRINIVASAN
分类号 G03C1/00 主分类号 G03C1/00
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