| 摘要 |
PROBLEM TO BE SOLVED: To provide an AlRu sputtering target which has a homogeneous structure, is reduced in the content of oxygen, thus allows the prevention or suppression of generation of particles in the formation of a sputtering film, leading to the improvement in the yield of the product, can be prepared stably at a low cost, and is suitable for the preparation of a film for a hard disk, and to provide a method for preparation thereof. SOLUTION: Al and Ru to form into raw materials are subjected to high frequency melting, so as to be powder essentially consisting of an Al13Ru4 intermetallic compound, and Ru powder is mixed therein, and the mixture is sintered. Further, an AlRu sputtering target as a sintered compact comprising 95 vol.% or more of an AlRu intermetallic compound is prepared. COPYRIGHT: (C)2008,JPO&INPIT
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