| 摘要 |
An immersion exposure apparatus has a projection optical system and a substrate stage. The substrate stage includes a chuck and a top plate located around the substrate held by the chuck. The top plate includes a measurement reference member. A liquid contacting area, on the surface of the top plate, which comes into contact with the liquid in exposing the substrate is coated with a coating film exhibiting liquid repellency against the liquid, and the area other than the liquid contacting area on the surface of the measurement reference member is not coated with the coating film.
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