发明名称 |
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION |
摘要 |
A positive resist composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under action of an acid; and (C) a compound capable of decomposing under action of an acid to generate an acid. |
申请公布号 |
WO2008093856(A1) |
申请公布日期 |
2008.08.07 |
申请号 |
WO2008JP51698 |
申请日期 |
2008.01.28 |
申请人 |
FUJIFILM CORPORATION;WADA, KENJI |
发明人 |
WADA, KENJI |
分类号 |
G03F7/004;G03F7/039;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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