| 摘要 |
<p>The present invention provides apparatus for depositing a coating of material on a substrate (1431), the apparatus comprising a coating station (1434) and means for transporting the substrate relative to the coating station along a transport path, the coating station comprising a plurality of nozzles for depositing the coating material on the substrate as it moves relative to the coating station along the transport path and means (1435) for independently controlling the rate at which the coating material emerges from each of the nozzles.</p> |
