发明名称 METHOD AND DEVICE FOR ADJUSTING LINE HEAD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a technology of precisely adjusting a relative positional relationship between a light emitting element and a non-erect equal-magnification microlens in a line head that images a light beam from the light emitting element by means of the microlens. <P>SOLUTION: In a positional information acquisition process, positions of one or more target elements in the plurality of elements on an optical axis are acquired. In an optical axis adjustment process, a relative positional relationship between an element substrate and a microlens array is adjusted such that a distance in a face between a position where a position of the target element given by the positional information is projected on a virtual vertical face and a position where a position of an image of a light beam emitted from the target element is projected on the virtual vertical face by the microlens, satisfies a predetermined condition when a virtual face perpendicular to the optical axis of the microlens is defined to be the virtual vertical face. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008179097(A) 申请公布日期 2008.08.07
申请号 JP20070015754 申请日期 2007.01.26
申请人 SEIKO EPSON CORP 发明人 INOUE NOZOMI;TSUJINO KIYOSHI;IKUMA TAKESHI
分类号 B41J2/44;B41J2/45;B41J2/455;G02B3/00 主分类号 B41J2/44
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