发明名称 |
DIAMOND SINGLE CRYSTAL SUBSTRATE AND ITS PRODUCTION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a high-quality diamond single crystal substrate usable even for semiconductor use within a short time at a lower cost. SOLUTION: The diamond single crystal substrate is one comprising at least two layers of different nitrogen atom contents, consisting of at least a layer having a nitrogen atom content of 0-10 ppm based on carbon atoms and a layer having a nitrogen atom content of 5-100 ppm based on carbon atoms, wherein the nitrogen atom content of the layer of the nitrogen atom content of 5-100 ppm is higher than that of the layer of the nitrogen content of 0-10 ppm, and these layers are formed by adjusting the gas introducing amounts of gases containing nitrogen atoms in a vapor-phase synthesis method. COPYRIGHT: (C)2008,JPO&INPIT
|
申请公布号 |
JP2008179505(A) |
申请公布日期 |
2008.08.07 |
申请号 |
JP20070013858 |
申请日期 |
2007.01.24 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
IZUMI KENJI;MEGURO KIICHI;IMAI TAKAHIRO |
分类号 |
C30B29/04;C23C16/27;C23C16/511 |
主分类号 |
C30B29/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|