发明名称 DIAMOND SINGLE CRYSTAL SUBSTRATE AND ITS PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a high-quality diamond single crystal substrate usable even for semiconductor use within a short time at a lower cost. SOLUTION: The diamond single crystal substrate is one comprising at least two layers of different nitrogen atom contents, consisting of at least a layer having a nitrogen atom content of 0-10 ppm based on carbon atoms and a layer having a nitrogen atom content of 5-100 ppm based on carbon atoms, wherein the nitrogen atom content of the layer of the nitrogen atom content of 5-100 ppm is higher than that of the layer of the nitrogen content of 0-10 ppm, and these layers are formed by adjusting the gas introducing amounts of gases containing nitrogen atoms in a vapor-phase synthesis method. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008179505(A) 申请公布日期 2008.08.07
申请号 JP20070013858 申请日期 2007.01.24
申请人 SUMITOMO ELECTRIC IND LTD 发明人 IZUMI KENJI;MEGURO KIICHI;IMAI TAKAHIRO
分类号 C30B29/04;C23C16/27;C23C16/511 主分类号 C30B29/04
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