SEMICONDUCTOR PROCESS CHAMBER

摘要

A process chamber 10 comprising a container ( 12 ), a lid ( 14 ), and a sealed interface ( 16 ) therebetween. The container's interface surface ( 30 ) and/or the lid's interface surface ( 32 ) includes at least one groove ( 36 ) in which a seal ( 40 ) is situated. The seal ( 40 ) comprises an elastomeric element ( 50 ) and a metallic element ( 60 ). The elastomeric element ( 50 ) and the metallic element ( 60 ) can be arranged and adapted to seal the chamber's interface ( 16 ) sequentially during its conversion to a sealed condition. And/or the elastomeric element ( 50 ) and the metallic element ( 60 ) can be arranged and adapted to seal the chamber's interface in series once the lid ( 14 ) is in its sealed condition.