| 发明名称 |
Aqueous dispersion useful for chemical-mechanical polishing of conductive metal films contains an abrasive in the form of fumed alumina |
| 摘要 |
<p>Aqueous dispersion with a pH of 3-7 contains 1-35 wt.% of an abrasive in the form of fumed alumina with a surface area of 50-200 m 2>/g and a mean aggregate diameter of less than 200 nm.</p> |
| 申请公布号 |
DE102007005291(A1) |
申请公布日期 |
2008.08.07 |
| 申请号 |
DE20071005291 |
申请日期 |
2007.02.02 |
| 申请人 |
EVONIK DEGUSSA GMBH |
发明人 |
LORTZ, WOLFGANG |
| 分类号 |
C09G1/02;C01F7/30;C09G1/04;H01L21/461 |
主分类号 |
C09G1/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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