| 摘要 |
A method and an apparatus for detecting a position of an electrode pad are provided to cover a target region by separately photographing the target region. A target region setting process is performed to set a photograph target region having a size larger than a size of a semiconductor chip on a semiconductor wafer(S205). A separate photograph process is performed to photography a set photograph target region, to enlarge a region smaller than the set photograph target region, and to photograph the enlarged region(S206,S207). A position detection process is performed to detect a position of an electrode pad of the semiconductor chip from an image obtained through the separate photograph process(S209,S210,S211,S213). |
