| 摘要 |
A plasma treatment apparatus having a cap for preventing an arcking phenomenon is provided to prevent the arcking from being generated between plasma and a coupling member in a process chamber due to the cap disposed on the coupling member. A plasma treatment apparatus(1) includes a process chamber(10), an insulating member, an electrostatic chuck(20), a coupling member(60), and a cap(40). Plasma(70) is generated in the plasma chamber. The insulating member is disposed in the process chamber. The electrostatic chuck is disposed on the insulating member to fix a substrate(30) and has a coupling groove(50) to be coupled with the insulating member. The coupling member couples the electrostatic chuck with the insulating member through the coupling groove. The cap is disposed inside the coupling groove and covers an upper part of the coupling member to prevent the generation of arcking in the coupling member. |
