METHOD AND APPARATUS FOR INSPECTING DEFECTS ON MASK

摘要

A method and an apparatus for inspecting defects on a mask are provided to detect the defects by irradiating light onto a surface of a wafer and obtaining an image on the wafer. A mask including a test pattern for inspecting a defect on a transparent substrate is prepared(110). A wafer defect inspection unit including a defect inspection part and a wafer stage is prepared(120). The wafer defect inspection part detects a defect by irradiating light onto a surface of a wafer and obtaining an image on the basis of the reflected light. A wafer is loaded on the wafer stage. The wafer stage is exchanged with a mask stage at the height corresponding to the height of the surface of the wafer loaded on the wafer stage(130). The mask is loaded on the mask stage. A mask defect is detected by operating the wafer defect inspection unit, irradiating the light onto the surface of the mask, and obtaining the image(190).