| 摘要 |
A chemically amplified resist composition comprises a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein R<1> represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one - CH2- is substituted with-COO-, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkaline aqueous solution but becomes soluble in an alkaline aqueous solution by the action of an acid, and at least two salts selected from a salt represented by the formula (II): <CHE>A<+ ->03C(Y<1>Y<2>)C02-R<21>```(II)</CHE> wherein Y<1> and Y<2> each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A<+> represents an organic counter ion and R<21> represents a C1-C30 hydrocarbon group which may be substituted and at least one -CH2- in the C1-C30 hydrocarbon group may be substituted with -CO- or -0-, and a salt represented by the formula (III): <CHE>A'<+> -03S G R<23></CHE> wherein R<23> represents a C1-C8 linear or branched chain perfluoroalkyl group and A'<+> represents an organic counter ion. |
