| 摘要 |
A seal type substrate cleaning apparatus is provided to prevent a watermark from being formed due to a contamination of a substrate by performing a substrate cleaning process, while a chamber is sealed from outside. A seal type substrate cleaning apparatus includes a chamber(100), a substrate support unit(110), a bowl(120), a cover unit(130), and a nozzle unit(140). A cleaning process is performed in the chamber. The substrate support unit supports the substrate in the chamber. The bowl is arranged to surround the substrate support unit. The cover unit is arranged on the bowl and opens/closes an upper surface of the bowl. The nozzle unit is arranged between the substrate support unit and the cover unit and sprays a chemical or drying gas on the substrate. During a cleaning process, an inner portion of the bowl is sealed by the cover unit.
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