| 摘要 |
<p>A developing apparatus for manufacturing a mask is provided to remove effectively foreign materials and bubbles from a developer and to inject uniformly the developer. A mask substrate is loaded onto a chuck(200) in order to perform an electron beam write operation on a resist. An injection nozzle(400) is formed to inject a developer onto the resist. A buffer tank(500) is used for storing the developer to be supplied to the injection nozzle. A nozzle filter part(610) is installed at an end of the injection nozzle in order to filter the developer to be injected. The nozzle filter unit includes a filter housing inserted into the end of the injection nozzle, a filter facing the end of the nozzle within the housing, a spacer for separating the filter and the end of the injection nozzle from each other, and an O-ring part wound around the end of the nozzle in order to prevent separation and leakage from the end of the nozzle.</p> |
