| 摘要 |
An apparatus for processing a substrate is provided to improve an operation efficiency of a cleaning process by uniformly spraying a cleaning agent inside a process chamber. An apparatus for processing a substrate includes a process chamber and a top nozzle(200). A substrate treating process is performed in the process chamber. Plural first spray holes(212) are formed on a lower surface of a nozzle body unit(210). Plural second spray holes(214) are formed on a side surface of the nozzle body unit. A nozzle support unit(220) is connected to the upper surface of the nozzle body unit and supports the nozzle body unit. The top nozzle is arranged on the process chamber. A cleaning agent for cleaning an inner portion of the process chamber is sprayed through the top nozzle.
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