| 摘要 |
<p>An inspection method and apparatus, a lithographic apparatus, a lithographic processing cell, and a device manufacturing method are provided to enhance efficiency by using a scatterometry method. An illumination unit(IL) receives a radiation beam from a radiation source(SO). The radiation beam is passed from the radiation source to the illumination unit with an aid of a beam delivery system(BD). The illumination includes an adjuster(AD) for adjusting an angular intensity distribution of the radiation beam. The radiation beam is irradiated onto a patterning device(MA). The patterning device is held on a support structure(MT). The radiation beam is patterned by the patterning device. The radiation beam passes through a projection system(PS) for focusing the beam onto a target portion of a substrate(W).</p> |
