| 摘要 |
A support member and an apparatus for treating a substrate with the same are provided to prevent the contact of support pins to a cell region formed on a substrate by easily changing a contact region between the substrate and the support pins. A housing(10) provides a space for performing a substrate treating process therein. A suction member sucks air in the housing. A treating-gas supply member(30) supplies treating-gas into the housing. A support member supports a substrate in the housing. The support member includes a plate(110), support pins(130), and lift pins(122). The support pins are attached on the plate to support the substrate by magnetic force. The lift pins move up and down through a hole provided on the plate. The lift pins put the substrate on the support pins or separate it from the support pins. A magnetic material is provided on an upper portion of the plate. The support pins have a magnet on lower portions thereof.
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