发明名称 Device manufacturing method and device, electro-optic device, and electronic equipment
摘要 A device manufacturing method, including: a first process for providing the plural elements on the original substrate via a separation layer in a condition where terminal sections are exposed to a surface on an opposite side to the separation layer; a second process for adhering the surface where the terminal sections of the elements to be transferred on the original substrate are exposed, via conductive adhesive, to a surface of the final substrate on a side where conductive sections for conducting with the terminal sections of the elements are provided; a third process for producing exfoliation in the separation layer between the original substrate and the final substrate; and a fourth process for separating the original substrate from which the transfer of elements has been completed, from the final substrate.
申请公布号 US7408207(B2) 申请公布日期 2008.08.05
申请号 US20050205169 申请日期 2005.08.17
申请人 SEIKO EPSON CORPORATION 发明人 HASHIMOTO TAKASHI;TAKAKUWA ATSHUSHI;KAMAKURA TOMOYUKI;UTSUNOMIYA SUMIO
分类号 G02F1/1368;H01L31/0328;H01L21/02;H01L21/336;H01L21/77;H01L21/84;H01L27/108;H01L27/12;H01L27/13;H01L29/745;H01L29/786 主分类号 G02F1/1368
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