Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.04,8] nonan-3-one ring and photoresist resin composition

摘要

A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I); wherein R^a is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloalkyl group of 1 to 6 carbon atoms; each of R¹ and R² is identical to or different from a hydrogen atom or a hydrocarbon group, provided that at least one of R¹ and R² is a hydrocarbon group; R¹ and R² may be bonded together to form a ring with an adjacent carbon atom; and each of R³, R⁴, R⁵, R⁶, R⁷, R⁸ and R⁹ is identical to or different from a hydrogen atom or a hydrocarbon group. This polymeric compound has not only high substrate adhesion and high etching resistance but also high solubility for a resist solvent.