| 摘要 |
<p>A method for manufacturing a gray tone blank mask and a photo mask is provided to easily control a CD(Critical Dimension) of a semi-transmit layer by increasing an etching speed of the semi-transmit layer to lower a temperature of an etchant. A gray tone photo mask includes a shielding pattern(6), a transmit pattern(7), and a semi-transmit pattern(8) which are formed on a transparent substrate. A semi-transmit layer(2) is laminated on the transparent substrate and a shielding layer(3) is laminated on the semi-transmit layer. An anti-reflective layer(4) is selectively laminated. The semi-transmit layer includes Ta, one or more elements selected from a group consisting of Al, Zn, Co, W, Mo, V, Pd, Ti, Pt, Mn, Fe, Ni, Cd, Zr, Mg, Li, Se, Cu, Y, S In, Sn, B, Be, and Si, and one or more elements selected from a group consisting of C, O, N, F, Cl, and H. An etchant contains one of NaOH, KOH, LiOH, and CsOH.</p> |
