发明名称 METHOD OF DRYING SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME
摘要 A method and an apparatus of drying a substrate are provided to improve a drying efficiency of the substrate by lowering a humidity level in a drying chamber by removing moistures from the air inside the drying chamber. An apparatus of drying a substrate includes a drying chamber(11), a demoisturizing unit(100), and a demoisturizing member. A substrate is received in the drying chamber. The demoisturizing unit is provided in the drying chamber. The demoisturizing member is received in the demoisturizing unit and absorbs the moisture, which is included in the air in the drying chamber. The demoisturizing member includes a liquid demoisturizer. The demoisturizer is LiBr. The demoisturizing unit includes a housing and a cover.
申请公布号 KR20080071641(A) 申请公布日期 2008.08.05
申请号 KR20070009726 申请日期 2007.01.31
申请人 SEMES CO., LTD. 发明人 CHOI, KYUNG HO
分类号 H01L21/304 主分类号 H01L21/304
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