发明名称 Semiconductor device and manufacturing method thereof
摘要 A semiconductor device packaged in three dimensions comprises a first thin film device, a second thin film device, and a third thin film device, each of the first, second, and third thin film devices comprising a first insulating film, a first electrode formed over the first insulating film, a second insulating film formed over the first electrode, first and second thin film transistors formed over the second insulating film, wherein the first thin film transistor is connected to the first electrode through a first contact hole, a third insulating film formed over the first and second thin film transistor, a second electrode formed over the third insulating film, wherein the second electrode is connected to the second thin film transistor through a second contact hole, and a fourth insulating film formed over the third insulating film and the second electrode.
申请公布号 US7408193(B2) 申请公布日期 2008.08.05
申请号 US20060530353 申请日期 2006.09.08
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 ISHIKAWA AKIRA
分类号 H01L29/10;G02F1/1333;G02F1/1368;H01L21/77;H01L21/84 主分类号 H01L29/10
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