| 摘要 |
A support member and an apparatus and a method for treating substrate with the same are provided to prevent a lower surface of a substrate from being polluted due to a treating liquid during a coating process by supporting the substrate horizontality. A housing(12) provides a space, where a process for treating a substrate is performed, therein. A support member(100) supports the substrate in the housing during the treatment process. A treating fluid supplying unit(20) sprays a treating fluid to the substrate supported by the support member. The support member includes a plate(110), a spin chuck(120), and a support body(130). The spin chuck is installed on the plate and supports the substrate during a spin treating process. The support body is installed on the plate to wrap an external side of the spin chuck. The support body has a ring-shaped upper surface, so that it is line-contacted or surface-contacted to the lower surface of the substrate during a development process.
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