| 摘要 |
<p>An article support, a lithography apparatus, and an immersion lithographic apparatus are provided to implement a thermal stabilization on an article by using a channel configuration for guiding a media. An article support(2) is configured to support an article for a lithographic process. The article support is comprised of a plurality of protrusions, and a channel configuration for providing thermal stabilization on the article. The channel configuration is arranged to guide a media for providing thermal stabilization in the article support. The channel configuration includes an input channel structure(9) and an output channel structure(10). The input and output channel structures are arranged in a nested configuration and connected to each other by a fine grid structure prepared on a surface of the article support or in the vicinity of the surface. The fine grid structure is prepared by an internal burl structure.</p> |
