| 摘要 |
<p>An exposure apparatus (EX) is provided with an optical unit (U) which specifies a first exposure region (AR1) and a second exposure region (AR2) at different positions in a first direction and irradiates each of the first exposure region and the second exposure region with exposure light (EL); and a first shift system (4) which relatively shifts the first exposure region, the second exposure region and a substrate in the first direction. While relatively shifting the first exposure region, the second exposure region and a prescribed region on the substrate (P), each of the first exposure region and the second exposure region is irradiated with the exposure light (EL) by an optical unit (U). Thus, the prescribed region on the substrate (P) is multiply-exposed with a first pattern image formed by the exposure light applied on the first exposure region and a second pattern image formed by the exposure light applied on the second exposure region. Deterioration of throughput is suppressed and multiple exposure can be efficiently performed to the substrate.</p> |
