PLASMA REACTOR WITH ION DISTRIBUTION UNIFORMITY CONTROLLER EMPLOYING PLURAL VHF SOUCRES

摘要

A plasma reactor with ion distribution uniformity controller employing plural VHF sources is provided to change relative output power levels of a first and second VHF power sources by using a programmed controller. A ceiling electrode(226) faces a pedestal. A pedestal electrode is positioned in the pedestal. A first and second VHF power sources(240,242) of different frequencies are coupled to the same or to different ones of the ceiling electrode and the pedestal electrode. A controller is programmed to change relative output power levels of the first and second VHF power sources to increase the relative output power level of the first VHF power source whenever plasma ion distribution has a predominantly edge-high non-uniformity and to increase the relative output power level of the second VHF power source whenever the plasma ion distribution has a predominantly center-high non-uniformity.