Plasma generation and control using a dual frequency RF source,申请号KR20040062975-传众专利搜索

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发明名称	Plasma generation and control using a dual frequency RF source
摘要
申请公布号	KR100849708(B1)	申请公布日期	2008.08.01
申请号	KR20040062975	申请日期	2004.08.10
申请人		发明人
分类号	H01L21/3065;H01J37/32	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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