发明名称 DEVICE FOR MANUFACTURING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a device for manufacturing semiconductor which prevents the atmosphere from entering the inner part of a nozzle-standby tank, to restrain the clogging of a pipe during standby. SOLUTION: The device for manufacturing semiconductor is provided with a stage which holds a semiconductor wefar and rotates; a nozzle 20 having in its lower part a feeding hole which feeds a chemical liquid to the surface of the semiconductor wefar held on the stage, and the chemical liquid reacting with the atmosphere to harden; a nozzle-standby tank 10 which is arranged at a standby position of the nozzle 20 and has in its upper face an aperture part 12, in which the lower part of the nozzle 20 is inserted; and a cover 14 which is fixed to a part above the feeding hole of the nozzle 20 and closes the aperture part 12, when the lower part of the nozzle 20 is inserted in the aperture part 12. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008176161(A) 申请公布日期 2008.07.31
申请号 JP20070010988 申请日期 2007.01.22
申请人 SEIKO EPSON CORP 发明人 OTA TAKEJI
分类号 G03F7/16;H01L21/027 主分类号 G03F7/16
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