METHOD OF PERFORMING LITHOGRAPHY AND LITHOGRAPHY SYSTEM
摘要
Methods of performing lithography include calculating a displacement vector (74) for a lithography tool (50) using an image (60) of a portion of the lithography tool (50) and a portion of a substrate (10) and an additional image (28) of a portion of an additional lithography tool (30) and a portion of the substrate (10). Methods of aligning objects include positioning a second object (30) proximate a first object (10) and acquiring a first image (38) illustrating a feature (32) on a surface of the second object (30) and a feature (18) on a surface of the first object (10). As additional object (50) is positioned proximate the first object (10), and an additional image (60) is acquired that illustrates a feature (52) on a surface of the additional object (50) and the feature (18) on the surface of the first object (10). The additional image (60) is compared with the first image (38). Imprint molds (30, 50) include at least one non-marking reference feature (32, 52) on animprinting surface of the imprint molds (30, 50).
申请公布号
WO2008016651(A3)
申请公布日期
2008.07.31
申请号
WO2007US17195
申请日期
2007.07.30
申请人
HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P.;PICCIOTTO, CARL;GAO, JUN;WU, WEI;YU, ZHAONING