发明名称 PARTICLE MONITOR SYSTEM AND SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a particle monitor system capable of detecting accurately the number or the size of particles flowing inside an exhaust pipe. SOLUTION: On a bypass line 16 communicating a chamber 11 with a DP 17, the particle monitor system is arranged, which is constituted of a laser light oscillation device 21 for irradiating laser light, a photomultiplier 22 having a focal point FP on a center axis of the bypass line 16 and on a crossing part of the laser light, and a particle focusing member 23 comprising a disk-shaped member, and the particle focusing member 23 has a through hole 24 facing to the focal point FP, and an aperture 25 is formed between the bypass line 16 and a fringe part of the particle focusing member 23. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008175590(A) 申请公布日期 2008.07.31
申请号 JP20070007367 申请日期 2007.01.16
申请人 TOKYO ELECTRON LTD 发明人 MORIYA TAKESHI
分类号 G01N15/14;C23C16/44;G01N21/53;G01N21/59;G01N21/94;H01L21/205;H01L21/3065 主分类号 G01N15/14
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