COATING FORMING AGENT FOR PATTERN FINING, AND METHOD FOR FINE PATTERN FORMATION USING THE SAME

摘要

This invention provides a coating forming agent for pattern fining, which does not cause any defect after fining treatment, can suppress and control a variation in the level of fining even in fining treatment of an ultrafine resist pattern, particularly having a size of not more than 120 nm with an enhanced aspect ratio, can maintain a good resist pattern shape after the fining treatment while maintaining the desired fining level, and, at the same time, can eliminate troubles caused by the occurrence of bacteria and the like within a wafer plane after the coating of a coating forming agent for pattern fining, and a method for fine pattern formation using the coating forming agent. The coating forming agent for pattern fining is a coating forming agent for use in the formation of a fine pattern covered on a substrate with a photoresist pattern and is characterized by comprising (a) a water soluble polymer and (b) at least one compound selected from quaternary ammonium hydroxides, alicyclic ammonium hydroxides, and morpholinium hydroxide.