发明名称 ELECTROSTATIC CHUCK
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an electrostatic chuck which remarkably reduces the number of particles attaching to the rear face of a plate-like sample even if the plate-like sample stuck by electrostatic attraction on a mounting plane by irradiation of electron beams is electrified, and can quickly separate the plate-like sample stuck by electrostatic attraction from the mounting plane when the application of voltage is stopped. <P>SOLUTION: The electrostatic chuck comprises: a base 7 which has one principal plane serving as a mounting plane 2a for mounting the plate-like sample and includes internal electrodes 4 and 4 for electrostatic attraction inside; and terminals 6 and 6 which are held by the base 7 and apply voltage to the internal electrodes 4 and 4 for electrostatic attraction. The base 7 is made of a flat plate-like silicon carbide-aluminum oxide composite sintered material containing not less than 1 mass% and not more than 30 wt.% of silicon carbide, and the surface roughness Ra of the mounting plane 2a is 0.01μm or less. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008177339(A) 申请公布日期 2008.07.31
申请号 JP20070009055 申请日期 2007.01.18
申请人 SUMITOMO OSAKA CEMENT CO LTD 发明人 MORIYA YOSHIAKI
分类号 H01L21/683 主分类号 H01L21/683
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