MEMBER FOR PLASMA PROCESSOR

摘要

PROBLEM TO BE SOLVED: To provide a member for plasma processor superior in corrosion resistance against a halogen-based corrosive gas, plasma or the like, also superior in heat shock resistance, and usable for manufacturing apparatus for semiconductors and liquid crystals, particularly for places requiring conductivity in plasma treating apparatus. SOLUTION: The member is formed of an yttria ceramic fired body which is formed by dispersing 50-300 wt.% of tungsten and/or molybdenum in yttria, has the open porosity of 0.2% or smaller, the volume resistivity of 10-6to 10-1Ωcm at 25°C, and the heat shock resistance temperature of 150°C or higher. COPYRIGHT: (C)2008,JPO&INPIT