发明名称 |
APPARATUS AND METHOD FOR DELIVERING VAPOR PHASE REAGENT TO A DEPOSITION CHAMBER |
摘要 |
This invention relates to a vapor or liquid phase reagent dispensing apparatus having a: metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus also has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
|
申请公布号 |
US2008179767(A1) |
申请公布日期 |
2008.07.31 |
申请号 |
US20080014194 |
申请日期 |
2008.01.15 |
申请人 |
SPOHN RONALD F;PETERS DAVID WALTER |
发明人 |
SPOHN RONALD F.;PETERS DAVID WALTER |
分类号 |
B01D19/00;B01D47/02;B67D7/00;B67D99/00;C23C16/00 |
主分类号 |
B01D19/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|