发明名称 APPARATUS AND METHOD FOR DELIVERING VAPOR PHASE REAGENT TO A DEPOSITION CHAMBER
摘要 This invention relates to a vapor or liquid phase reagent dispensing apparatus having a: metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened opposing flat surfaces of the top wall member and the protuberance have a hardness greater than the hardness of the metal seal. The apparatus also has a temperature sensor and a source chemical level sensor extending through a centrally located portion of the top wall member and generally vertically downwardly to a sump cavity centrally located on a bottom wall member. The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
申请公布号 US2008179767(A1) 申请公布日期 2008.07.31
申请号 US20080014194 申请日期 2008.01.15
申请人 SPOHN RONALD F;PETERS DAVID WALTER 发明人 SPOHN RONALD F.;PETERS DAVID WALTER
分类号 B01D19/00;B01D47/02;B67D7/00;B67D99/00;C23C16/00 主分类号 B01D19/00
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