发明名称 |
Substrate processing unit and substrate processing apparatus |
摘要 |
A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate holder and within the pan, having in its interior a chemical processing section; and a cell cover, capable of closing a top opening of the cell, having a plurality of spray nozzles for separately spraying at least two types of processing liquids, wherein the pan and the cell each have an individual liquid discharge line.
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申请公布号 |
US2008178800(A1) |
申请公布日期 |
2008.07.31 |
申请号 |
US20080076834 |
申请日期 |
2008.03.24 |
申请人 |
KATSUOKA SEIJI;SEKIMOTO MASAHIKO;WATANABE TERUYUKI;KATO RYO;YOKOYAMA TOSHIO;SUZUKI KENICHI;KOBAYASHI KENICHI |
发明人 |
KATSUOKA SEIJI;SEKIMOTO MASAHIKO;WATANABE TERUYUKI;KATO RYO;YOKOYAMA TOSHIO;SUZUKI KENICHI;KOBAYASHI KENICHI |
分类号 |
B05C3/02;B05B15/12;B05C3/09;B05C9/06;B05C11/10;B05C13/00;B05C15/00;B05D3/12;B65H1/00;C23C2/00;C23C18/16;C23C18/31;C25D17/06;H01L21/00;H01L21/288;H01L21/68;H01L21/683;H01L21/768 |
主分类号 |
B05C3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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