发明名称 Substrate processing unit and substrate processing apparatus
摘要 A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate holder and within the pan, having in its interior a chemical processing section; and a cell cover, capable of closing a top opening of the cell, having a plurality of spray nozzles for separately spraying at least two types of processing liquids, wherein the pan and the cell each have an individual liquid discharge line.
申请公布号 US2008178800(A1) 申请公布日期 2008.07.31
申请号 US20080076834 申请日期 2008.03.24
申请人 KATSUOKA SEIJI;SEKIMOTO MASAHIKO;WATANABE TERUYUKI;KATO RYO;YOKOYAMA TOSHIO;SUZUKI KENICHI;KOBAYASHI KENICHI 发明人 KATSUOKA SEIJI;SEKIMOTO MASAHIKO;WATANABE TERUYUKI;KATO RYO;YOKOYAMA TOSHIO;SUZUKI KENICHI;KOBAYASHI KENICHI
分类号 B05C3/02;B05B15/12;B05C3/09;B05C9/06;B05C11/10;B05C13/00;B05C15/00;B05D3/12;B65H1/00;C23C2/00;C23C18/16;C23C18/31;C25D17/06;H01L21/00;H01L21/288;H01L21/68;H01L21/683;H01L21/768 主分类号 B05C3/02
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