发明名称 LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXPOSING METHOD, AND DEVICE FABRICATING METHOD
摘要 A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening.
申请公布号 WO2008091014(A2) 申请公布日期 2008.07.31
申请号 WO2008JP51328 申请日期 2008.01.23
申请人 NIKON CORPORATION;NAGASAKA, HIROYUKI 发明人 NAGASAKA, HIROYUKI
分类号 G03F7/20 主分类号 G03F7/20
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