发明名称 MANUFACTURING METHOD OF PATTERNED VAPOR DEPOSITION FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a vapor deposition film having high-definition patterns without using a metal mask difficult to realize a high definition and a high price laser scan apparatus. <P>SOLUTION: The manufacturing method of the patterned vapor deposition film comprises: a step for preparing a vapor deposition panel which contains a substrate, a plurality of heat generating bodies and a vapor deposition material layer on the plurality of heat generating bodies, and in which the vapor deposition material layer forms its outermost surface; a step for arranging the vapor deposition panel and a device substrate so that the vapor deposition material layer is opposed to the device substrate; and a step for obtaining the vapor deposition film by making at least a part of the heat generating bodies generate heat, selectively evaporating the vapor deposition material layers positioned on the heat generating bodies generating heat to be deposited on the surface of the device substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008174783(A) 申请公布日期 2008.07.31
申请号 JP20070008423 申请日期 2007.01.17
申请人 FUJI ELECTRIC HOLDINGS CO LTD 发明人 KAWAMURA YUKINORI;TERAMOTO RYOHEI;KAWAGUCHI GOJI
分类号 C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/04
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