| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion beam processing device capable of correcting abnormalities, if any, or otherwise cutting off causes of abnormalities and preventing itself from being used at an abnormal state, by monitoring if ion beams are normal or abnormal. SOLUTION: With the use of first and second blankers 128, 132, and first and second Faraday cups 130, 134, beam currents are monitored at top and bottom points of a projection mask 115 by changing on-offs of the first and the second blankers 128, 132. With this, while damage of the projection mask 115 is restrained, abnormality information of ion beams is obtained, enabled to cut off causes of abnormalities and correct abnormalities. Thus, a stable processing by ion beams is realized, and the ion beam processing device can be stably used. COPYRIGHT: (C)2008,JPO&INPIT
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