发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To prevent the occurrence of crystal failure in a diffused layer after laser light is given for laser trimming without dropping the degree of integration of an element subject to laser trimming, and to suppress leakage current at a PN junction. SOLUTION: A diffused layer 6 as an electrode lead-out part of an aluminum fuse 1 is directly covered with a protective film 9. The protective film 9 is made of doped polysilicon. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008177270(A) 申请公布日期 2008.07.31
申请号 JP20070007962 申请日期 2007.01.17
申请人 ELPIDA MEMORY INC;HITACHI ULSI SYSTEMS CO LTD 发明人 ASANO SHINTARO;FUKAHORI KAZUTOSHI;MIYATAKE SHINICHI
分类号 H01L21/82 主分类号 H01L21/82
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