发明名称 |
SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To prevent the occurrence of crystal failure in a diffused layer after laser light is given for laser trimming without dropping the degree of integration of an element subject to laser trimming, and to suppress leakage current at a PN junction. SOLUTION: A diffused layer 6 as an electrode lead-out part of an aluminum fuse 1 is directly covered with a protective film 9. The protective film 9 is made of doped polysilicon. COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008177270(A) |
申请公布日期 |
2008.07.31 |
申请号 |
JP20070007962 |
申请日期 |
2007.01.17 |
申请人 |
ELPIDA MEMORY INC;HITACHI ULSI SYSTEMS CO LTD |
发明人 |
ASANO SHINTARO;FUKAHORI KAZUTOSHI;MIYATAKE SHINICHI |
分类号 |
H01L21/82 |
主分类号 |
H01L21/82 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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