| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To create a new method and device for manufacturing a substrate for a thin-film solar cell, inexpensive and having better electrical and optical performances than the conventional types (transparent electrode) that is manufactured by means of a thermal CVD process or an MOCVD process, using HF plasma CVD technology which manufactures a film having a large area and also using an inexpensive organic metal material as a raw material, and also to provide an apparatus using the same, and the technology related thereto. <P>SOLUTION: By using an HF plasma CVD apparatus that uses an organic metal material as a raw material, a transparent electrode film made up of a two-layers structure of a crystalline titanium oxide film and a crystalline zinc oxide film, is formed on a transparent insulating substrate. The crystalline zinc oxide film may be manufactured by utilizing a sputtering apparatus. As a result, a high-conductivity and high optical transparency substrate for a thin-film solar cell, which is inexpensive and has optical confinement effects (uneven surface structure of the film), is provided. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
