| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To accurately measure the height of a sample surface in an electron beam drawing device. <P>SOLUTION: The electron beam drawing device draws a pattern on a sample surface by deflecting an electron beam with a deflector, and includes a light source 61 to measure the height position of the sample 2, an optical system to irradiate the surface of the sample with light emitting from the light source, and a detector 75 including a light receiving element and detecting the height position of the sample by the position of receiving the reflected light from the sample surface. The light irradiating the sample contains P-waves and S-waves in a controlled mixing ratio so as to increase the reflectance. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
