发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS
摘要 A method for manufacturing a semiconductor device includes: (a) transferring an electronic component that has an electrode and formed on a first substrate from the first substrate to a second substrate; and (b) forming a wiring line electrically coupling the electrode and a terminal on the second substrate. A cavity is provided between the electrode of the electronic component transferred on the second substrate and the second substrate, and the wiring line is formed in the cavity.
申请公布号 US2008179759(A1) 申请公布日期 2008.07.31
申请号 US20080019958 申请日期 2008.01.25
申请人 SEIKO EPSON CORPORATION 发明人 IRIGUCHI CHIHARU
分类号 H01L23/48;H01L21/58 主分类号 H01L23/48
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